Evaporator.jpg

Equipment : Thermal Evaporator

Model  :  KOREA VACUUM TECH, KVE-T2010

 

Application:

-Metal deposition (Al, Cu, Au, Pd, Ni, Cr, Ti, Co)

General information

-Sample Size: 4’’, up to 4 wafers
-Vacuum pressure: ~ 2.0E-6 Torr
-Film thickness uniformity: < 5%

 

-Substrate: rotate (O) heating/cooling (X)