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Equipment : Horizontal Furnace

Model  :  SJF-2000-T3

 

Application:

Annealing for semiconductor fabrication

-Si oxidation, High temperature annealing, Forming gas annealing, etc

 

General information

-Wafer size : 4 inch, 8 inch
-Max 3 tubes
-Temp Range : 400°C ~ 1100°C
-Temperature accuracy : ±1°C
-Fully automatic computer control
-Loading speed : 10~600 mm/min

 

-Capacity : 25 wafers