Authors B. J. Cho and C. K. Kim 
Journal/Conference J. Appl. Phys. 
Date Jun. 1990. 
volume vol. 67 
Number no. 12 
Page pp. 7583-7586 

B. J. Cho and C. K. Kim, "Elimination of slips on silicon wafer edge in rapid thermal process by using a ring oxide", J. Appl. Phys., vol. 67, no. 12, pp. 7583-7586, Jun. 1990.