Authors J. G. Kim, B. J. Cho, and C. K. Kim 
Journal/Conference J. Electrochem. Soc 
Date Sep. 1990. 
volume vol. 137 
Number no. 9 
Page pp. 2857-2860 

J. G. Kim, B. J. Cho, and C. K. Kim, "AES study of rapid thermal boron diffusion into silicon from a solid diffusion source in oxygen ambient", J. Electrochem. Soc., vol. 137, no. 9, pp. 2857-2860, Sep. 1990.