Authors C. H. Ang, C. H. Ling, Z. Y. Cheng, S. J. Kim, and B. J. Cho 
Journal/Conference J. Electrochem. Soc. 
Date Dec. 2000. 
volume vol. 147 
Number no. 12 
Page pp. 4676-4682 

C. H. Ang, C. H. Ling, Z. Y. Cheng, S. J. Kim, and B. J. Cho, "Annealing of Fowler-Nordheim stress-induced leakage currents in thin silicon dioxide films", J. Electrochem. Soc., vol. 147, no. 12, pp. 4676-4682, Dec. 2000.