Authors W. Y. Loh, B. J. Cho, C. H. Ang, J. Z. Zheng, and D. L. Kwong 
Journal/Conference IEEE Trans. on Electron Devices 
Date Apr. 2003. 
volume vol. 50 
Number no. 4 
Page pp. 967 

W. Y. Loh, B. J. Cho, C. H. Ang, J. Z. Zheng, and D. L. Kwong, "Localized oxide degradation in ultra-thin gate dielectric and its statistical analysis," IEEE Trans. on Electron Devices, vol. 50, no. 4, p. 967, Apr. 2003.