Authors H.Hu, C. Zhu, Y. F. Lu, Y. H. Wu, T. Liew, M. F. Li, B. J. Cho, W. K. Choi, and N. Yakovlev 
Journal/Conference J. Appl. Phys. 
Date March 2003. 
volume vol. 94 
Number no. 1 
Page p. 551 

H.Hu, C. Zhu, Y. F. Lu, Y. H. Wu, T. Liew, M. F. Li, B. J. Cho, W. K. Choi, and N. Yakovlev, "Physical and electrical characterization of HfO2 Metal-Insulator-Metal capacitors for Si analog circuit applications," J. Appl. Phys., vol. 94, no. 1, p. 551, 2003.