Authors M. Y. Yang, C. H. Huang, A. Chin, C. Zhu, B. J. Cho, M. F. Li, and D. L. Kwong 
Journal/Conference IEEE Trans. Microw. Wireless Compon. Lett. 
Date Oct. 2003. 
volume vol. 13 
Number no. 10 
Page pp. 431-433 

M. Y. Yang, C. H. Huang, A. Chin, C. Zhu, B. J. Cho, M. F. Li, and D. L. Kwong, "Very high density RF MIM capacitors (17 fF/um2) using high-K Al2O3 doped Ta2O5 dielectrics, IEEE Trans. Microw. Wireless Compon. Lett. , vol. 13, no. 10, pp. 431-433, Oct. 2003.