Authors M. S. Joo, B. J. Cho, C. C. Yeo, D. S. H. Chan, S. J. Whoang, N. Balasubramanian, and D. L. Kwong 
Journal/Conference IEEE Trans. Electron Devices 
Date Oct. 2003. 
volume vol. 50 
Number no. 10 
Page pp. 2088 

M. S. Joo, B. J. Cho, C. C. Yeo, D. S. H. Chan, S. J. Whoang, N. Balasubramanian, and D. L. Kwong, "Formation of Hafnium-Aluminum-oxide gate dielectric using single cocktail liquid source in MOCVD process," IEEE Trans. Electron Devices, vol. 50, no. 10, p. 2088, Oct. 2003.