Authors C. S. Park, B. J. Cho, and D.-L. Kwong 
Journal/Conference IEEE Electron Device Lett. 
Date Jun. 2004. 
volume vol. 25 
Number no. 6 
Page pp. 372-374 

C. S. Park, B. J. Cho, and D.-L. Kwong, "Thermally Stable Fully Silicided Hf-Silicide Metal Gate Electrode," IEEE Electron Device Lett., vol. 25, no. 6, pp. 372-374, Jun. 2004.