Authors C. S. Park, B. J. Cho, and D. L. Kwong 
Journal/Conference IEEE Electron Device Lett. 
Date Sep. 2004. 
volume vol. 25 
Number no. 9 
Page pp. 619-621 

C. S. Park, B. J. Cho, and D. L. Kwong, "MOS characteristics of synthesized HfAlON/HfO2 stack using AlN/HfO2," IEEE Electron Device Lett., vol. 25, no. 9, pp. 619-621, Sep. 2004.