Authors Y. N. Tan, W. K. Chim, W. K. Choi, M. S. Joo, and B. J. Cho 
Journal/Conference IEEE Trans. Electron Devices 
Date Apr. 2006. 
volume vol. 53 
Number no. 4 
Page pp. 654-662 

Y. N. Tan, W. K. Chim, W. K. Choi, M. S. Joo, and B. J. Cho, "Hafnium Aluminum Oxide as charge storage and blocking layers in SONOS type Non-volatile memory for high speed operation," IEEE Trans. Electron Devices, vol. 53, no. 4, pp. 654-662, Apr. 2006.