Authors W. S. Hwang, B. J. Cho, and D. S. H. Chan, V. Bliznetsov, and W. J. Yoo 
Journal/Conference J. Vacuum sci. & technol. B 
Date Nov/Dec 2006. 
volume vol. B24 
Number no. 6 
Page pp. 2689-2694 

W. S. Hwang, B. J. Cho, and D. S. H. Chan, V. Bliznetsov, and W. J. Yoo, "Effects of SiO2/Si3N4 hard masks on etching properties of metal gates," J. Vacuum sci. & technol. B, vol. B 24 (6), pp. 2689-2694, Nov/Dec 2006.