Authors G. K. Kalapati, Y. Tong, W. Y. Loh, H. K. Mun, and B. J. Cho 
Journal/Conference Appl. Phys. Lett. 
Date May. 2007. 
volume vol. 90 
Page p. 183510 

G.K.Kalapati, Y.Tong, W.Y.Loh, H.K.Mun, and B.J.Cho, "Impact of interfacial layer control using Gd2O3 in HfO2 gate dielectric," Appl. Phys. Lett., vol. 90, p. 183510, May. 2007.