Authors W. S. Hwang, B. J. Cho, D.S.H. Chan, S. W. Lee, and W. J. Yoo 
Journal/Conference J. Electrochem. Soc. 
Date Jan. 2008. 
volume vol. 155 
Number no. 1 
Page pp. H6-H10 

W. S. Hwang, B. J. Cho, D.S.H. Chan, S. W. Lee, and W. J. Yoo, “Effects of Volatility of Etch By-products on Surface Roughness During Etching of Metal Gates in Cl2”, J. Electrochem. Soc., vol. 155, no. 1, pp. H6-H10, Jan. 2008.