Authors O. J. Sul, J. H. Bong, A. Yoon, and B. J. Cho 
Journal/Conference J. Nanosci. & Nanotech. 
Date Jan. 2015. 
volume vol. 14 
Number no. 1 
Page pp. 220-223 

O. J. Sul, J. H. Bong, A. Yoon, and B. J. Cho, "Improvement of gate dielectric integrity using O2 plasma treatment prior to atomic layer deposition on chemical vapor deposition grown graphene", J. Nanosci. & Nanotech., vol. 14, pp 1-4, 2014.